TECHNOLOGY/BUSINESS OPPORTUNITY Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS)

Inactive on SAM.gov — responses were due 13 Aug 2026 · Unrestricted (full and open) · Department of Energy (DOE) · Livermore, CA · NAICS 334413 · Solicitation 2025-185

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Solicitation details

Solicitation number2025-185
Notice IDcc6e4b8f2ae843609784bc41117d088a
AgencyDepartment of Energy (DOE)
Contracting officeLLNS DOE CONTRACTOR
NAICS code334413 — Semiconductor and Related Device Manufacturing
Set-asideUnrestricted (full and open)
Notice typeSpecial Notice
Posted13 July 2026
Response deadline13 August 2026 (closed)
Place of performanceLivermore, CA, USA

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Description

Opportunity: Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract no. DE-AC52-07NA27344 (Contract 44) with the U.S. Department of Energy (DOE), is offering the opportunity to enter into a collaboration to further develop and commercialize its Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS). Background: High-energy and high-peak-power pulsed laser systems are enabling technologies for particle acceleration, nuclear fusion, additive manufacturing, defense and more. Newer laser systems continually push the limits of laser pulse energy and peak power to drive stronger laser-matter interactions. There is a pressing need for tighter customization of pulse shaping and tunable polarization in applications such as particle acceleration and coupling laser pulse energy to EUV source materials for increased yield of relevant particles/radiation. Description: Performance at bottlenecks of these high energy laser systems can be enhanced by careful manipulation of the laser pulse and laser beam qualities using CLASPS. This enables spatial phase and polarization laser shaping, which can address dynamic thermal birefringence and accumulation of other nonideal optical aberrations that make it difficult to control laser beam wavefronts. Advantages/Benefits: Much lower costs vs. deformable mirror wavefront shapers Much higher laser damage threshold wavefront shaping component technology Potential Applications: Polarization/Wavefront shaping for damage-free operation of IFE class laser drivers, high peak power laser based particle accelerators Key enabling technology for higher EUV photon yield EUV and beyond EUV laser drivers for high throughput semiconductor patterning and manufacture. Development Status: Current stage of technology development: TRL ? 0-2 ? 3-5 ? 5-9 LLNL has filed for patent protection on this invention. LLNL is seeking industry partners with a demonstrated ability to bring such inventions to the market. Moving critical technology beyond the Laboratory to the commercial world helps our licensees gain a competitive edge in the marketplace. All licensing activities are conducted under policies relating to the strict nondisclosure of company proprietary information. Please visit the IPO website at https://ipo.llnl.gov/resources for more information on working with LLNL and the industrial partnering and technology transfer process. Note: THIS IS NOT A PROCUREMENT. Companies interested in commercializing LLNL's Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS) should provide an electronic OR written statement of interest, which includes the following: Company Name and address. The name, address, and telephone number of a point of contact. A description of corporate expertise and/or facilities relevant to commercializing this technology. Please provide a complete electronic OR written statement to ensure consideration of your interest in LLNL's Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS). The subject heading in an email response should include the Notice ID and/or the title of LLNL s Technology/Business Opportunity and directed to the Primary and Secondary Point of Contacts listed below. Written responses should be directed to: Lawrence Livermore National Laboratory Innovation and Partnerships Office P.O. Box 808, L-779 Livermore, CA 94551-0808 Attention: 2025-185

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